Т. 13, № 3

Неразрушающий контроль качества термообработки стальных образцов, полученных аддитивной технологией, магнитошумовым методом

2022-11-11T16:02:13Z

Неразрушающий контроль качества термообработки стальных образцов, полученных аддитивной технологией, магнитошумовым методом Бусько, В. Н.; Крень, А. П.; Ланцман, Г. А. Производство изделий по аддитивным технологиям, как правило, сопровождается несанкционированным появлением и ростом неоднородности свойств, анизотропии, остаточных напряжений, пористости и других дефектов. Поэтому резко возросла актуальность неразрушающего контроля качества изделий, полученных с помощью аддитивных технологий. Цель работы – экспериментально исследовать возможность контроля и оценки качества термической обработки трёхмерных и литых образцов с помощью неразрушающих методов контроля. Исследовались стальные образцы из низколегированной стали 09Г2С, полученные методом селективного лазерного сплавления с разными видами и режимами последующих термических обработок и литьём. Методами исследования являлись магнитошумовой метод, реализующий магнитный метод эффекта Баркгаузена, и контактно-динамический метод измерения твёрдости материала. Экспериментально установлено, что оба метода обладают высокой чувствительностью к отожжённым и нормализованным трёхмерным образцам и их отбраковке. Магнитошумовой метод, в отличие от метода твёрдометрии, связанного, преимущественно, с фазово-структурными изменениями, благодаря селективности к другим контролируемым параметрам, дополнительно обладает чувствительностью к литьевым образцам, хотя микроструктуры литых и нормализованных трёхмерных образцов по данным рентгеноструктурного анализа близки между собой. Магнитошумовой метод может быть использован в качестве одного из физических методов оценки качества и контроля термообработки 3D-образцов на стадии изготовления при отработке их видов, режимов и разбраковке образцов.

Tensor Calculus in Digital Colorimetry

2022-11-11T16:02:07Z

Tensor Calculus in Digital Colorimetry Saukova, Y.; Hundzina, M. Any object can have many implementations in the form of digital images and any digital image can be processed many times increasing or decreasing accuracy and reliability. Digital colorimetry faces the need to work out issues of ensuring accuracy, metrological traceability and reliability. The purpose of this work was to generalize approaches to the description of multidimensional quantized spaces and show the possibilities of their adaptation to digital colorimetry. This approach will minimize the private and global risks in measurements. For color identification digital colorimetry uses standard color models and spaces. Most of them are empirical and are improved during the transition from standard to real observation conditions taking into account the phenomena of vision and the age of observers. From the point of view of measurement, a digital image can be represented by a combinatorial model of an information and measurement channel with the appearance of the phenomenon of a color covariance hypercube requiring a significant amount of memory for data storage and processing. The transition from the covariance hypercube to high-dimensional matrices and tensors of the first, second and higher ranks provides the prospect of optimizing the color parameters of a digital image by the criterion of information entropy. Tensor calculus provides opportunities for expanding the dynamic range in color measurements describing multidimensional vector fields and quantized spaces with indexing tensors and decomposing them into matrices of low orders. The proposed complex approach based on tensor calculus. According to this approach the color space is a set of directed vector fields undergoing sampling, quantization and coding operations. Also it is a dynamic open system exchanging information with the environment at a given level and to identify color with specified levels of accuracy, reliability, uncertainty and entropy.

Non-Additive Quantity Measurement Model

2022-11-11T16:02:19Z

Non-Additive Quantity Measurement Model Romanchak, V. M.; Serenkov, P. S. This work considers a model for measuring non-additive quantities, in particular a model for subjective measurement. The purpose of this work was to develop the measurement theory and form of a measurement model that uses the corrected S. Stevens measurement model. A generalized structure was considered that included an empirical system, a mathematical system, and a homomorphism of the empirical system into a numerical system. The main shortcomings of classical measurement theories seem to be: 1) homomorphism does not display operations (in this case, one cannot speak of the meaningfulness of the model); and 2) there is no empirical measurement model that could confirm the existence of a homomorphism. To overcome the shortcomings of existing theories a definition of the measurement equation is given. As a result a measurement model is obtained that is free from the shortcomings of classical measurement theories. The model uses the corrected model of S. Stevens and the reflection principle of J. Barzilai. The measurement model was tested using laws that were obtained empirically. Using the model it is shown that Fechnerʼs empirical law is equivalent to Stevensʼs empirical law. This means that the problem which has attracted attention of many researchers for almost a century, has been solved. A numerical example demonstrates the possibilities of the proposed measurement model. It is shown that the model can be used for extended analysis of expert assessments.

Spectral Ellipsometry as a Method of Investigation of Influence of Rapid Thermal Processing of Silicon Wafers on their Optical Characteristics

2022-11-11T16:02:16Z

Spectral Ellipsometry as a Method of Investigation of Influence of Rapid Thermal Processing of Silicon Wafers on their Optical Characteristics Solodukha, V. A.; Pilipenko, U. A.; Omelchenko, A. A.; Shestovski, D. V. One of the possible ways of improvement of the surface properties of silicon is the solid phase recrystallization of the surface silicon layer after the chemical-mechanical polishing with application of the rapid thermal treatment with the pulses of second duration. The purpose of the given paper is investigation of influence of the rapid thermal treatment of the initial silicon wafers of the various doping level and reticular density on their optical characteristics by means of the spectral ellipsometry method. The investigation results are presented by means of the spectral ellipsometry method of the rapid thermal processing influence on the initial silicon wafers (KDB12 orientation <100>, KDB10 orientation <111> and KDB0.005 orientation <100>) of the various level of doping and reticular density influence on their optical characteristics: refraction and absorption ratios. Influence was confirmed of the silicon reticular density on its optical characteristics before and after the rapid thermal processing. It was shown, that reduction of the refraction and absorption ratios in the center of the Brillouin zone for the silicon samples with the high Boron concentration after the rapid thermal processing as compared with the low doped silicon. In the area of the maximum absorption peak, corresponding to the energy of the electron exit from the silicon surface (4.34 eV) the refraction indicator of the high doped silicon becomes higher, than of the low doped silicon, which is determined by the high concentration of the vacant charge carriers on the silicon surface in this spectral range. It was established, that the spectral area 3.59–4.67 eV, corresponding to the work of the electrons, exiting the silicon surface, the most informative way shows the difference of the 3 optical parameters of silicon of the different orientation, and for evaluation of influence of the silicon doping level on its optical characteristics the most informative is the spectral range of 3.32–4.34 eV.